Surface reactions during the a-Si : H growth in the diode and triode glow-discharge reactors
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference27 articles.
1. Plasma spectroscopy control and analysis of a-Si:H deposition
2. Plasma spectroscopy—Glow discharge deposition of hydrogenated amorphous silicon
3. Laser-induced fluorescence detection of reactive intermediates in diffusion flames and in glow-discharge deposition reactors
4. Measurement of the SiH3Radical Density in Silane Plasma using Infrared Diode Laser Absorption Spectroscopy
5. Neutral radical detection in silane glow-discharge plasma using coherent anti-stokes raman spectroscopy
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3. Development of the Effective Reaction Model for Diamond Deposition Simulation within the Continuous Media Approach;EPJ Web of Conferences;2019
4. Amorphous and Microcrystalline Silicon;Springer Handbook of Electronic and Photonic Materials;2017
5. Optimization of intrinsic hydrogenated amorphous silicon deposited by very high-frequency plasma-enhanced chemical vapor deposition using the relationship between Urbach energy and silane depletion fraction for solar cell application;Thin Solid Films;2013-11
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