High dielectric temperature stability in the relaxor ferroelectric thin films via using a multilayer heterostructure-Reference-Cited by-同舟云学术

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High dielectric temperature stability in the relaxor ferroelectric thin films via using a multilayer heterostructure

Published:2024-03 Issue: Volume:242 Page:115895
ISSN:1359-6462
Container-title:Scripta Materialia
language:en
Short-container-title:Scripta Materialia

Author:

Zhang Jie,Chen Xiaoyang^ORCID,Ding MingJian,Chen Jiaqiang,Yu Ping

Funder

National Natural Science Foundation of China-Guangdong Joint Fund

Natural Science Foundation of Sichuan Province

National Natural Science Foundation of China

Fundamental Research Funds for the Central Universities

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science,Mechanics of Materials,Metals and Alloys,Mechanical Engineering

Reference31 articles.

1. Flexible high-temperature dielectric materials from polymer nanocomposites;Li;Nature,2015

2. Ultrahigh capacitive energy density in ion-bombarded relaxor ferroelectric films;Kim;Science,2020

3. Ultrahigh−energy density lead-free dielectric films via polymorphic nanodomain design;Pan;Science,2019

4. High-density embedded deep trench capacitors in silicon with enhanced breakdown voltage;Johari;IEEE T. Compon. Pack,2009

5. Perspectives on domain engineering for dielectric energy storage thin films;Liu;Appl. Phys. Lett.,2022

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