Effect of microstructures on the electrical and optoelectronic properties of nanocrystalline Ta–Si–N thin films by reactive magnetron cosputtering
Author:
Publisher
Elsevier BV
Subject
Condensed Matter Physics,General Materials Science,Mechanics of Materials,Metals and Alloys,Mechanical Engineering
Reference21 articles.
1. Single layer and multilayer wear resistant coatings of (Ti,Al)N: a review
2. Effect of composition on thermal stability and electrical resistivity of Ta–Si–N films
3. Decomposition and nanocrystallization in reactively sputtered amorphous Ta–Si–N thin films
4. Tantalum‐based diffusion barriers in Si/Cu VLSI metallizations
5. Influence of nitrogen content on the crystallization behavior of thin Ta–Si–N diffusion barriers
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1. The effect of the Ar/N2 gas ratio on the structure and properties of Ta-Si-N coatings produced by magnetron sputtering of TaSi2 target;Surfaces and Interfaces;2023-04
2. Transparent and passive Ta–Si–N thin films barrier layer;MRS Communications;2021-11-18
3. Fabrication of Ta-Si-C targets and their utilization for deposition of low friction wear resistant nanocomposite Si-Ta-C-(N) coatings intended for wide temperature range tribological applications;Surface and Coatings Technology;2019-02
4. Fabrication of Ta–Si–N/Ag nanocomposite thin films with near-zero temperature coefficient of resistance;Journal of Alloys and Compounds;2015-08
5. Mechanical and corrosion properties of TaN coatings by N2/Ar flow ratio processes;Surface Engineering;2013-09
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