Thin film reactions in the system Ti-Si-O-N-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Thin film reactions in the system Ti-Si-O-N

Published:1988-11 Issue:2 Volume:35 Page:186-198
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Kuiper A.E.T.,Willemsen M.F.C.,Barbour J.C.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference20 articles.

1. Development of the Self-Aligned Titanium Silicide Process for VLSI Applications

2. In situ investigation of TiN formation on top of TiSi2

3. Thin‐film reaction between Ti and Si3N4

4. Applications of Ion Beams to Metals;Krautle,1978

5. Formation of TiSi2 and TiN during nitrogen annealing of magnetron sputtered Ti films

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thin film interaction between low-k dielectric hydrogen silsesquioxane (HSQ) and Ti barrier layer;Thin Solid Films;2000-02

2. A Comparative Study of Ti/Low-k HSQ (Hydrogen Silsesquioxane) and Ti/TEOS (Tetraethylorthosilicate) Structures at Elevated Temperatures;MRS Proceedings;2000

3. Reaction kinetics in the Ti/SiO2system and Ti thickness dependence on reaction rate;Journal of Applied Physics;1994-07

4. The use of in situ analysis in developing new metallization schemes;Thin Solid Films;1993-02

5. An Auger and electron energy‐loss study of reactions at the Ti‐SiO2interface;Journal of Applied Physics;1991-06-15

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3