Author:
Zeng Yuxiao,Russell Stephen W.,McKerrow Andrew J.,Chen Peijun,Alford T.L.
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Cited by
11 articles.
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1. Differences in erosion mechanism and selectivity between Ti and TiN in fluorocarbon plasmas for dielectric etch;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-07
2. Low Dielectric Constant Materials;Chemical Reviews;2009-12-04
3. Adhesion of proton beam written high aspect ratio hydrogen silsesquioxane (HSQ) nanostructures on different metallic substrates;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2009-10
4. Proton beam written hydrogen silsesquioxane (HSQ) nanostructures for Nickel electroplating;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2009-06
5. Influences of Ti, TiN, Ta and TaN layers on integration of low-k SiOC:H and Cu;Materials Chemistry and Physics;2007-07