Gas-jet electron beam plasma chemical vapor deposition method for solar cell application-Reference-Cited by-同舟云学术

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Gas-jet electron beam plasma chemical vapor deposition method for solar cell application

Published:2005-11-15 Issue:2-3 Volume:89 Page:99-111
ISSN:0927-0248
Container-title:Solar Energy Materials and Solar Cells
language:en
Short-container-title:Solar Energy Materials and Solar Cells

Author:

SHARAFUTDINOV R,KHMEL S,SHCHUKIN V,PONOMAREV M,BARANOV E,VOLKOV A,SEMENOVA O,FEDINA L,DOBROVOLSKY P,KOLESOV B

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Cited by 31 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. A review of various single layer, bilayer, and multilayer TCO materials and their applications;Materials Chemistry and Physics;2022-12

3. HIGH-TEMPERATURE ANNEALING OF SILICON SUBOXIDE THIN FILMS OBTAINED BY GAS-JET ELECTRON BEAM PLASMA CHEMICAL VAPOR DEPOSITION;Journal of Applied Mechanics and Technical Physics;2022-11

4. Decay of Electron-Beam-Generated Argon Plasma upon Outflow into Unexcited Gas;Plasma Physics Reports;2022-06

5. Development of a minimizable pulsed plasma source with structure induced focusability;Journal of Applied Physics;2022-01-14

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