Interactions in the Co–Ni–Si system at 800°C
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials
Reference7 articles.
1. The Co-Si (Cobalt-Silicon) system
2. Growth of intermediate phases in Co/Si diffusion couples: Bulk versus thin‐film studies
3. Analysis of the diffusion controlled growth of cobalt silicides in bulk and thin film couples
4. The Ni−Si (Nickel-Silicon) system
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3. Phase formation sequence and cobalt behavior in the Ni0.9 Co0.1 system during the thin film solid-state formation;Microelectronic Engineering;2018-11
4. The influence of alloying on the phase formation sequence of ultra-thin nickel silicide films and on the inheritance of texture;Journal of Applied Physics;2018-05-14
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