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Auto-correlation function analysis of phase formation in iron ion-implanted amorphous silicon layers

  • Published:2004-08 Issue:1 Volume:461 Page:126-130
  • ISSN:0040-6090
  • Container-title:Thin Solid Films
  • language:en
  • Short-container-title:Thin Solid Films

Author:

Yang T.H,Chueh Y.L,Chen H.C,Chen L.J,Chou L.J

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Observation of room-temperature superparamagnetic behavior of Fe5Si3 nanocrystals synthesized via 50 keV Fe ion implantation in silicon;Applied Physics A;2020-02-26

2. Formation and characterization of embedded Fe3Si binary structures in Si;Journal of Applied Physics;2019-05-21

3. Investigation of various phases of Fe–Si structures formed in Si by low energy Fe ion implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2015-12

4. The formation of magnetic silicide Fe3Si clusters during ion implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2014-05

5. Formation of iron and iron silicides on silicon and iron surfaces. Role of the deposition rate and volumetric effects;Applied Physics A;2012-11-21
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