Probing effect of temperature on energy storage properties of relaxor-ferroelectric epitaxial Pb0.92La0.08Zr0.52Ti0.48O3 thin film capacitors
Author:
Funder
NASA
NSF
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference28 articles.
1. Physics of thin-film ferroelectric oxides;Dawber;Rev. Mod. Phys.,2005
2. Nonlinear dielectric thin films for high-power electric storage with energy density comparable with electrochemical capacitors;Yao,1968
3. Novel ferroelectric polymer composites with high dielectric constants;Dang;Adv. Mater.,2003
4. Novel ferroelectric polymers for high energy density and low loss dielectrics;Zhu;Macromolecules,2012
5. Polarization relaxation in thin-film relaxors compared to that in ferroelectrics;Tyunina;Phys. Rev. B,2006
Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Energy Storage Properties and Enhanced Breakdown Strength of Calcium-Doped Barium Zirconate Titanate Thin Films Prepared by Sol-Gel Method;2024
2. Microcrystalline structure modulation and energy storage properties of BaZr0.25Ti0.75O3 thin films;Journal of Alloys and Compounds;2022-06
3. Influence of substrate temperature on the energy storage properties of bismuth magnesian niobium thin films prepared by magnetron sputtering;Ceramics International;2021-03
4. Microcrystalline Structure Modulation and Energy Storage Properties of BaZr <sub>0.25</sub>Ti <sub>0.75</sub>O <sub>3</sub> Thin Films;SSRN Electronic Journal;2021
5. Switching On/Off Negative Capacitance in Ultrathin Ferroelectric/Dielectric Capacitors;ACS Applied Materials & Interfaces;2020-02-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3