Photo current through SnO2/SiC/p-Si(100) structures-Reference-Cited by-同舟云学术

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Photo current through SnO2/SiC/p-Si(100) structures

Published:2006-06 Issue:1-2 Volume:508 Page:385-388
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Nishikawa Syuhei,Hashimoto Hideaki,Chikamoto Motonori,Horikoshi Kosuke,Aoki Minoru,Arima Kenta,Uchikosi Junichi,Morita Mizuho

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. A novel method of optical detection using a capacitive device

2. Total Room Temperature Wet Cleaning for Si Substrate Surface

3. Single‐crystalline, epitaxial cubic SiC films grown on (100) Si at 750 °C by chemical vapor deposition

4. Low Temperature P‐Doped SiC Growth by Chemical Vapor Deposition Using CH 3SiH3 / PH 3 Gas

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. p-Si/n-CrSe2 Heterojunctions Designed as High-Frequency Capacitors and Photosensors;Journal of Electronic Materials;2024-03-17

2. Growth of Polycrystalline n- CrSe2 Nanosheets Onto p –Si Substrates and their Applications as Rectifiers and Gigahertz Band Filters;Silicon;2024-01-08

3. High-performance carbon-rich amorphous silicon–carbon alloy semiconductors with low optical gaps;Physica E: Low-dimensional Systems and Nanostructures;2023-04

4. Effect of amorphous SiC layer on electrical and optical properties of Al/a-SiC/c-Si Schottky diode for optoelectronic applications;Journal of Materials Science: Materials in Electronics;2021-07-16

5. Microcrystalline Structure and Light-Emitting Properties of 3C–SiC Island Films Grown on the Si(100) Surface;Physics of the Solid State;2019-07

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