Nanocrystalline TiO2 thin film prepared by low-temperature plasma-enhanced chemical vapor deposition for photocatalytic applications-Reference-Cited by-同舟云学术

Nanocrystalline TiO2 thin film prepared by low-temperature plasma-enhanced chemical vapor deposition for photocatalytic applications

Published:2015-08 Issue: Volume:589 Page:770-777
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Zhou Ming,Roualdès Stéphanie^ORCID,Zhao Jie,Autès Vincent,Ayral André

Funder

European Commission

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference36 articles.

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