In-situ ellipsometric monitor with layer-by-layer analysis for precise thickness control of EUV multilayer optics-Reference-Cited by-同舟云学术

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In-situ ellipsometric monitor with layer-by-layer analysis for precise thickness control of EUV multilayer optics

Published:2006-11 Issue:3 Volume:515 Page:947-951
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Tsuru T.,Yamamoto M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. Soft X-rays and Extreme Ultraviolet Radiation;Attwood,1999

2. Soft X-ray Optics;Spiller,1994

3. Boundary Structure of Mo/Si Multilayers for Soft X-Ray Mirrors

4. Structure and performance of Si/Mo multilayer mirrors for the extreme ultraviolet

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Cr/Sc/Mo multilayer for condenser optics in water window microscopes;Journal of Electron Spectroscopy and Related Phenomena;2017-10

2. Optical and structural characterization of SnO2:F/SiCxOy tandem thin films by spectroscopic ellipsometry;Thin Solid Films;2013-07

3. Development of spectroscopic transmission-type four detector polarimeter;Thin Solid Films;2011-02

4. Characterization of Mo/Si soft X-ray multilayer mirrors by grazing-incidence small-angle X-ray scattering;Vacuum;2009-08

5. Precise determination of layer structure with EUV ellipsometry data obtained by multilayer polarizing elements;physica status solidi (c);2008-05

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