Realtime layer-by-layer analysis for multilayer fabrication monitoring by an automatic null ellipsometer-Reference-Cited by-同舟云学术

Realtime layer-by-layer analysis for multilayer fabrication monitoring by an automatic null ellipsometer

Published:2004-05 Issue: Volume:455-456 Page:705-709
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Tsuru T.,Tsutou T.,Yamamoto M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. Soft X-rays and Extreme Ultraviolet Radiation;Attwood,1999

2. Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system

3. T. Hatano, H. Umetsu, M. Yamamoto, in: Y. Furukawa, Y. Mori, T. Kataoka (Eds.), Precision Science and Technology for Perfect Surfaces, Osaka, Japan, August 29–September 1, 1999, Proceedings of the 9th International Conference on Production Engineering, p. 292

4. Ellipsometry and Polarized Light;Azzam,1987

5. Circuit design for an electronic self-nulling ellipsometer

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