Effect of thermal coupling on the electronic properties of hydrogenated amorphous silicon thin films deposited by electron cyclotron resonance-Reference-Cited by-同舟云学术

Effect of thermal coupling on the electronic properties of hydrogenated amorphous silicon thin films deposited by electron cyclotron resonance

Published:2007-07 Issue:19 Volume:515 Page:7650-7653
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Dao T.H.,Gueunier-Farret M.E.,Daineka D.,Bulkin P.,Roca i Cabarrocas P.,Kleider J.P.,Longeaud C.,Bazin C.,Kervyn de Meerendre T.,Descamps P.,Leempoel P.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference19 articles.

1. Amorphous silicon solar cell

2. Control of plasma chemistry for preparing highly stabilized amorphous silicon at high growth rate

3. Amorphous silicon films and solar cells deposited by HWCVD at ultra-high deposition rates

4. Characterization of intrinsic amorphous silicon layers for solar cells prepared at extremely high rates by atmospheric pressure plasma chemical vapor deposition

5. Hydrogenated amorphous silicon deposited at very high growth rates by an expanding Ar–H2–SiH4 plasma

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1. Microcrystalline silicon thin films deposited by matrix-distributed electron cyclotron resonance plasma enhanced chemical vapor deposition using an SiF4 /H2chemistry;Journal of Physics D: Applied Physics;2016-06-21

2. Improvement in the electrical properties of Se- and S-doped hydrogenated amorphous silicon thin films by annealing;Journal of the Korean Physical Society;2013-05

3. Microcrystalline silicon films and solar cells deposited at high rate by Matrix Distributed Electron Cyclotron Resonance (MDECR) plasma;physica status solidi (c);2010-02-04

4. Distributed electron cyclotron resonance plasma: A technology for large area deposition of device-quality a-Si:H at very high rate;Thin Solid Films;2008-08

5. Advances in the deposition of microcrystalline silicon at high rate by distributed electron cyclotron resonance;Thin Solid Films;2008-08