Study on the growth mechanism of tin-doped indium oxide films deposited by direct current pulse magnetron sputtering-Reference-Cited by-同舟云学术

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Study on the growth mechanism of tin-doped indium oxide films deposited by direct current pulse magnetron sputtering

Published:2013-09 Issue: Volume:542 Page:415-419
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Wang Hualin,Liu Honglin,Ding Wanyu,Chai Weiping

Funder

National Natural Science Foundation of China

Dalian Science and Technology Plan Project

Natural Science Foundation of Liaoning Province, China

Program for Liaoning Excellent Talents in University

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference27 articles.

1. See-through OLED displays

2. Transparent conducting oxide semiconductors for transparent electrodes

3. Present status of transparent conducting oxide thin-film development for Indium-Tin-Oxide (ITO) substitutes

4. Transparent Conducting AZO Cosputtered ITO Anode Films Grown by a Dual Target DC Magnetron Sputtering for OLEDs

5. Evaporated Sn‐doped In2O3films: Basic optical properties and applications to energy‐efficient windows

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Study on the process of hydrogen-doped indium oxide for silicon heterojunction solar cell mass production;Solar Energy Materials and Solar Cells;2024-07

2. A deep understanding of relationship between reverse time and growth of ITO film deposited by direct current pulsed sputtering;Materials Letters;2018-06

3. A simple route to prepare (100) preferred orientation indium tin oxide film onto polyimide substrate by direct current pulsed magnetron sputtering;Materials Chemistry and Physics;2018-04

4. Microstructure evolution of Al-doped zinc oxide and Sn-doped indium oxide deposited by radio-frequency magnetron sputtering: A comparison;Journal of Applied Physics;2015-04-21

5. The nanocrystalline structure of TiO2 film deposited by DC magnetron sputtering at room temperature;Modern Physics Letters B;2014-10-20

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