The nanocrystalline structure of TiO2 film deposited by DC magnetron sputtering at room temperature

Abstract

At room temperature, titanium dioxide ( TiO 2) films were deposited by the direct current pulse magnetron sputtering technique. Varying O 2/ Ar flow ratio, TiO 2 films with different nanocrystalline structures were obtained. The high resolution transmission electron microscopy results show that with O 2/ Ar = 6/14, the nanocrystalline in rutile phase appears in as-deposited film. Then X-ray diffraction patterns of annealed films revealed that with O 2/ Ar = 6/14, the higher weight fractions of rutile TiO 2 appear in films. The optical emission spectroscopy results show that with O 2/ Ar < 6/14, O element was mainly existed as O -/ O + ions, instead of excited state of O atoms.