Sputtering deposition of P-type SnO films using robust Sn/SnO2 mixed target-Reference-Cited by-同舟云学术

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Sputtering deposition of P-type SnO films using robust Sn/SnO2 mixed target

Published:2014-03 Issue: Volume:555 Page:57-61
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Hsu Po-Ching,Chen Wei-Chung,Tsai Yu-Tang,Kung Yen-Cheng,Chang Ching-Hsiang,Wu Chung-Chih,Hsieh Hsing-Hung

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference17 articles.

1. Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors

2. β-Ga2O3 nanowires: Synthesis, characterization, and p-channel field-effect transistor

3. p-type field-effect transistor of NiO with electric double-layer gating

4. p-channel thin-film transistor using p-type oxide semiconductor, SnO

5. Epitaxial growth of high mobility Cu2O thin films and application to p-channel thin film transistor

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4. Tin/Tin Oxide Nanostructures: Formation, Application, and Atomic and Electronic Structure Peculiarities;Nanomaterials;2023-08-22

5. Phase Transitions, Mechanical and Dynamic Stability, and Electronic Properties of SnO Polymorphs under High Pressure;physica status solidi (b);2023-02-23

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