Microstructural defect characterisation of a-Si:H deposited by low temperature HW-CVD on paper substrates-Reference-Cited by-同舟云学术

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Microstructural defect characterisation of a-Si:H deposited by low temperature HW-CVD on paper substrates

Published:2006-04 Issue:1-2 Volume:501 Page:79-83
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Britton D.T.,Härting M.,Knoesen D.,Sigcau Z.,Nemalili F.P.,Ntsoane T.P.,Sperr P.,Egger W.,Nippus M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. Silicon for thin-film transistors

2. Status report: solar cell related research and development using amorphous and microcrystalline silicon deposited by HW(Cat)CVD

3. Hot-wire thin-film transistors on PET at 100 °C

4. An analytical model for predicting residual stresses in progressively deposited coatings Part 1: Planar geometry

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Paper Electronics;Advanced Materials;2011-03-23

2. Adjustable wettability of paperboard by liquid flame spray nanoparticle deposition;Applied Surface Science;2011-01

3. Ultrathin Silicon Circuits With Strain-Isolation Layers and Mesh Layouts for High-Performance Electronics on Fabric, Vinyl, Leather, and Paper;Advanced Materials;2009-09-25

4. Printed nanoparticulate composites for silicon thick-film electronics;Pure and Applied Chemistry;2006-01-01

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