1. S.M. Gates, in: S. Wagner, M. Hack, E. Schiff, R. Schropp, I. Shimizu (Eds.), Amorphous and Microcrystalline Silicon Technology, San Francisco, April 1997, Mater. Res. Soc. Symp. Proc. 467 (1997) 843
2. Sensitive Skin, Selected Topics in Electronics and Systems, vol. 18;Lumeski,2000
3. H. Gleskova, S. Wagner, Z. Suo, in: G.N. Parsons, C.C. Tsai, T.S. Fahlen, C.H. Seager (Eds.), Flat-Panel Display Materials, San Francisco, April 1998, Mater. Res. Soc. Symp. Proc. 508 (1998) 73
4. Stability of low-temperature amorphous silicon thin film transistors formed on glass and transparent plastic substrates
5. J.P. Conde, P. Alpuim, V. Chu, in: J.R. Abelson, J.B. Boyce, J.D. Cohen, H. Matsumura, J. Robertson (Eds.), Amorphous and Heterogeneous Silicon-Based Films, San Francisco, April 2002, Mater. Res. Soc. Symp. Proc. 715 (2002) A3.1