Study of reactive sputtering titanium oxide for metal-oxide-semiconductor capacitors
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
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4. Effect of Oxygen Partial Pressure on the Stoichiometric Composition of Titanium Oxide Films during Magnetron Sputtering;Physics of the Solid State;2021-12-22
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