Influence of growth temperature on the electrical and structural characteristics of conductive Al-doped ZnO thin films grown by atomic layer deposition-Reference-Cited by-同舟云学术

Influence of growth temperature on the electrical and structural characteristics of conductive Al-doped ZnO thin films grown by atomic layer deposition

Published:2013-10 Issue: Volume:545 Page:106-110
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Ahn Cheol Hyoun,Lee Sang Yeol,Cho Hyung Koun

Funder

Energy International Collaboration Research & Development Program of the Korea Institute of Energy Technology Evaluation and Planning (KETEP)

Ministry of Knowledge Economy (MKE)

National Research Foundation of Korea (NRF)

Korea government (MEST)

Basic Science Research Program

Ministry of Education, Science and Technology

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. A comprehensive review of ZnO materials and devices

2. Fundamentals of zinc oxide as a semiconductor

3. Deposition of Al doped ZnO layers with various electrical types by atomic layer deposition

4. Structural, optical, and electrical properties of (Zn,Al)O films over a wide range of compositions

5. Improved Electrical Stability in the Al Doped ZnO Thin-Film-Transistors Grown by Atomic Layer Deposition

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