Author:
Jang J.H.,Son S.Y.,Lim W.,Phen M.S.,Siebein K.,Craciun V.
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Cited by
1 articles.
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1. Relaxation of misfit strain in silicon-germanium (Si1−xGex) films during dry oxidation;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-11