Study on temperature-dependent growth characteristics of germanium oxide film by plasma-enhanced atomic layer deposition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference40 articles.
1. Ge pMOSFETs with GeOx passivation formed by ozone and plasma post oxidation;Xu;Nanoscale Res. Lett.,2019
2. Effect of GeO2 deposition temperature in atomic layer deposition on electrical properties of Ge gate stack;Kanematsu;Jpn. J. Appl. Phys.,2016
3. Combining GeO2 passivation strategies aiming at dielectric layers with superior properties on germanium substrates;Etcheverry;J. Mater. Chem. C,2019
4. Extrinsic interface formation of HfO2 and Al2O3/GeOx gate stacks on Ge (100) substrates;Seo;J. Appl. Phys.,2009
5. Evaluation of GeO desorption behavior in the metal/GeO2/Ge structure and its improvement of the electrical characteristics;Oniki;J. Appl. Phys.,2010
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. The fabrication of ultra-wide bandgap GeO2 thin films by DC magnetron sputtering: The impacts of growth temperature and post-annealing process;Vacuum;2024-07
2. Band alignment engineering at ultra-wide bandgap GeO2/SiO2 heterointerfaces;Results in Physics;2024-03
3. Structural and optical properties of Cu implanted Ge thin films;Physica B: Condensed Matter;2024-02
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3