Erratum to “Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring” [Thin Solid Films 455–456 (2004) 828

登录注册会员服务联系我们

Erratum to “Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring” [Thin Solid Films 455–456 (2004) 828–836]

Published:2004-12 Issue:1-2 Volume:468 Page:338
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Cited by 36 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A combination of library search and Levenberg-Marquardt algorithm in optical scatterometry;Thin Solid Films;2023-02

2. A Laplace sensitivity operator enhances the calculation efficiency of OCD metrology;Optics Express;2023-01-09

3. Plasmon-assisted optical critical dimension measurement for three-layer orthogonal metallic gratings;Photonics and Nanostructures - Fundamentals and Applications;2021-09

4. Ellipsometric Expressions for a Near-normal-incidence Ellipsometer with the Polarizer-compensator-sample-compensator-analyzer Configuration;KOREAN J OPT PHOTONI;2021

5. Optical response of rectangular array of elliptical plasmonic particles on glass revealed by Mueller matrix ellipsometry and finite element modeling;Journal of the Optical Society of America B;2019-06-17

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP