Deposition and DC electrical characterisation of rf magnetron sputtered silicon nitride thin films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference31 articles.
1. Electronic Processes in Metal-Silicon Nitride-Silicon Dioxide-Silicon Systems
2. Properties of plasma‐deposited Si‐rich silicon nitride films in current enhancement injectors
3. Interface Electronic Properties between Silicon and Silicon Nitride Deposited by Direct Photochemical Vapor Deposition
4. The Preparation and Properties of Thin Film Silicon-Nitrogen Compounds Produced by a Radio Frequency Glow Discharge Reaction
5. Optimization and characterization of remote plasma-enhanced chemical vapor deposition silicon nitride for the passivation of p-type crystalline silicon surfaces
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1. Reactive Sputtered Silicon Nitride as an Alternative Passivation Layer for Microelectrode Arrays in Sensitive Bioimpedimetric Cell Monitoring;ACS Applied Materials & Interfaces;2021-12-01
2. Mechanical and electrical properties of RF magnetron sputter deposited amorphous silicon-rich silicon nitride thin films;Thin Solid Films;2016-05
3. Fabrication and characterization of ultraviolet photodetectors based on silicon nitride nanostructures prepared by magnetron sputtering;Proceedings of the Institution of Mechanical Engineers, Part N: Journal of Nanomaterials, Nanoengineering and Nanosystems;2015-10-27
4. Mechanical and electrical properties of DC magnetron sputter deposited amorphous silicon nitride thin films;Thin Solid Films;2015-08
5. Silicon Nitride Films Deposited by RF Sputtering for Microstructure Fabrication in MEMS;Journal of Electronic Materials;2009-06-03
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