Organic acid-based wet etching behaviors of Ga-doped ZnO films sputter-deposited at different substrate temperatures-Reference-Cited by-同舟云学术

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Organic acid-based wet etching behaviors of Ga-doped ZnO films sputter-deposited at different substrate temperatures

Published:2010-05 Issue:14 Volume:518 Page:4046-4051
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Lee Dong-Kyoon,Bang Jungsik,Park Mungi,Lee Jae-Ho,Yang Heesun

Funder

Korea Science and Engineering Foundation

Ministry of Knowledge Economy

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Present status and future prospects for development of non- or reduced-indium transparent conducting oxide thin films

2. Electrosorption behavior of cations with carbon nanotubes and carbon nanofibres composite film electrodes

3. Present status of transparent conducting oxide thin-film development for Indium-Tin-Oxide (ITO) substitutes

4. Substitution of transparent conducting oxide thin films for indium tin oxide transparent electrode applications

5. Characteristics of flexible indium tin oxide electrode grown by continuous roll-to-roll sputtering process for flexible organic solar cells

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1. Karst landform-like VO2 single layer solution: Controllable morphology and excellent optical performance for smart glazing applications;Solar Energy Materials and Solar Cells;2020-06

2. Etching behavior of ZnO:Ga thin films;Materials Testing;2018-11-02

3. Comparative surfacing studies of sputtered and thermal annealed ZnO films wet etched with NH 4 Cl and acidic etchants;Surface and Coatings Technology;2017-12

4. Morphology Effect of the ZnO Surface via Organic Etchants for Photon Extraction in III-Nitride Emitters;ECS Journal of Solid State Science and Technology;2016-12-15

5. Comparative study of group-II alloying effects on physical property of ZnGaO transparent conductive films prepared by RF magnetron sputtering;Journal of Alloys and Compounds;2015-10

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