Comparative surfacing studies of sputtered and thermal annealed ZnO films wet etched with NH 4 Cl and acidic etchants-Reference-Cited by-同舟云学术

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Comparative surfacing studies of sputtered and thermal annealed ZnO films wet etched with NH 4 Cl and acidic etchants

Published:2017-12 Issue: Volume:331 Page:85-89
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Liu Liang-Kui,Shi Cheng,Wang Guan-Qing,Wang Yi,Sun Lei^ORCID

Funder

Natural Science Foundation of China

Importation and Development of High-Caliber Talents Project of Beijing Municipal Institutions

Beijing Nova Program Interdisciplinary Studies Cooperative

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference25 articles.

1. Piezoelectric nanogenerators based on zinc oxide nanowire arrays;Wang;Science,2006

2. ZnO-based transparent thin-film transistors;Hoffman;Appl. Phys. Lett.,2003

3. Transparent conducting oxide semiconductors for transparent electrodes;Minami;Semicond. Sci. Technol.,2005

4. Dry etching of ZnO using an inductively coupled plasma;Lee;J. Electrochem. Soc.,2001

5. Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films;Mehta;J. Vac. Sci. Technol. B,2009

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