A layer-by-layer Cat-CVD of conformal and stoichiometric silicon nitride with in-situ H2 post-treatment-Reference-Cited by-同舟云学术

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A layer-by-layer Cat-CVD of conformal and stoichiometric silicon nitride with in-situ H2 post-treatment

Published:2006-04 Issue:1-2 Volume:501 Page:160-163
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Kitazoe Makiko,Osono Shuuji,Itoh Hiromi,Asari Shin,Saito Kazuya,Hayama Masahiro

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference3 articles.

1. Conformal thin-film silicon nitride deposited by hot-wire chemical vapor deposition

2. Extended Abstract of the 2nd Int'l Conf. on Cat-CVD(Hot-Wire CVD) Process;Holt,2002

3. Akira Izumi, Hidekazu Sato, Shingi Hashioka, Manabu Kudo, Hideaki Matsumura, Microelectron. Eng., pp 495–503, 51–52 (2000), Elsevier Science B.V.

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Industrialization of Hot Wire Chemical Vapor Deposition for thin film applications;Thin Solid Films;2015-11

2. Coverage properties of SiNx films prepared by catalytic chemical vapor deposition on trenched substrates below 80 °C;Thin Solid Films;2008-03

3. ULVAC research and development of Cat-CVD applications;Thin Solid Films;2008-01

4. Various applications of silicon nitride by catalytic chemical vapor deposition for coating, passivation and insulating films;Thin Solid Films;2006-04

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