Deposition of nickel oxide by direct current reactive sputtering-Reference-Cited by-同舟云学术

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Deposition of nickel oxide by direct current reactive sputtering

Published:2012-02 Issue:9 Volume:520 Page:3609-3613
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Karpinski A.,Ferrec A.,Richard-Plouet M.,Cattin L.,Djouadi M.A.,Brohan L.,Jouan P.-Y.

Funder

Agence Nationale de la Recherche

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference28 articles.

1. NiO thin films by MOCVD of Ni(dmamb)2 and their resistance switching phenomena

2. Electrochromic behaviour of nickel oxide thin films deposited by thermal evaporation

3. Structural, optical, and electrical properties of p-type NiO films and composite TiO2/NiO electrodes for solid-state dye-sensitized solar cells

4. Preparation and characterization of nanostructured NiO thin films by reactive-pulsed laser ablation technique

5. Properties of NiO thin films deposited by intermittent spray pyrolysis process

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1. Enhancing the Oxygen Evolution Reaction Activity of Sputtered Ni, NiO, and NiNiO Thin Films by Incorporating Fe;ChemElectroChem;2024-01-22

2. Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors;Journal of Vacuum Science & Technology A;2024-01-17

3. Non-damaging growth and band alignment of p-type NiO/β-Ga₂O₃ heterojunction diodes for high power applications;Journal of Materials Chemistry C;2024

4. p-channel NiO thin film transistors grown with high k ZrO₂ gate oxide for low voltage operation;Physica Scripta;2023-05-04

5. Aerosol-assisted CVD of nickel oxide on silicon for hole selective contact layers;Journal of Materials Science: Materials in Electronics;2023-01

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