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Deposition of titanium nitride films onto silicon by an ion beam assisted deposition method

  • Published:2005-02 Issue:2 Volume:473 Page:340-345
  • ISSN:0040-6090
  • Container-title:Thin Solid Films
  • language:en
  • Short-container-title:Thin Solid Films

Author:

Yokota Katsuhiro,Nakamura Kazuhiro,Kasuya Tomohiko,Mukai Katsuhisa,Ohnishi Masami

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Synthesis and characterization of Titanium Silicon Nitride (TiSiN) thin film: A review;IOP Conference Series: Materials Science and Engineering;2018-06

2. Investigation of Titanium Silicon Nitride: A Review;Lecture Notes in Electrical Engineering;2017-10-29

3. Deposition of titanium nitride on Si(100) wafers using plasma focus;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2009-03

4. Growth, surface morphology, optical properties and electrical resistivity of ɛ-TiNx (0.4;Applied Surface Science;2008-12

5. Controlling pressure in microsystem packages by on-chip microdischarges between thin-film titanium electrodes;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2007
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