Morphology of TiN thin films grown on SiO2 by reactive high power impulse magnetron sputtering-Reference-Cited by-同舟云学术

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Morphology of TiN thin films grown on SiO2 by reactive high power impulse magnetron sputtering

Published:2011-12 Issue:5 Volume:520 Page:1621-1624
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Magnus F.,Ingason A.S.,Sveinsson O.B.,Olafsson S.,Gudmundsson J.T.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference30 articles.

1. Silicon VLSI Technology: Fundamentals, Practice, and Modeling;Plummer,2000

2. Efficiency of TiN diffusion barrier between Al and Si prepared by reactive evaporation and rapid thermal annealing

3. Evaluation of radio-frequency sputter-deposited textured TiN thin films as diffusion barriers between copper and silicon

4. Improved TiN film as a diffusion barrier between copper and silicon

5. High-<tex>$kappa$</tex>/Metal–Gate Stack and Its MOSFET Characteristics

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2. Thickness uniformity, electrical properties, and stress of sputtered TiN thin films;Journal of Physics: Conference Series;2024-08-01

3. Using a coupled optical and electrical monitoring method to follow the R-HiPIMS TiO₂ deposition process drifts;Physica Scripta;2024-03-27

4. Recent Developments and Applications of TiN-Based Films Synthesized by Magnetron Sputtering;Journal of Materials Engineering and Performance;2023-05-24

5. Dynamics of sputtered particles in multipulse HiPIMS discharge;Plasma Sources Science and Technology;2023-04-01

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