Author:
Rha Sa-Kyun,Lee Won-Jun,Lee Seung-Yun,Hwang Yong-Sup,Lee Yoon-Jik,Kim Dong-Il,Kim Dong-Won,Chun Soung-Soon,Park Chong-Ook
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference16 articles.
1. S.P. Muraka, in: G.C. Smith, R. Blumenthal (Eds.), Tungsten and Other Advanced Metals for VLSI Applications 1990, Material Research Society, Pittsburgh, 1991, p. 179.
2. P. Singer, Semiconductor International, September 1993, p. 34.
3. Copper impurity levels in silicon
4. Copper Transport in Thermal SiO2
5. Copper, lithium, and hydrogen passivation of boron inc-Si
Cited by
57 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献