Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process-Reference-Cited by-同舟云学术

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Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process

Published:2015-02 Issue: Volume:577 Page:143-148
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Lee Jong Geol,Kim Hyun Gi,Kim Sung Soo

Funder

Fundamental R&D Program for Technology of World Premier Materials

Kyung Hee University

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference23 articles.

1. Effect of Ag interlayer on the optical and passivation properties of flexible and transparent Al2O3/Ag/Al2O3 multilayer;Jeong;Appl. Phys. Lett.,2008

2. Gas diffusion ultrabarriers on polymer substrates using Al2O3 atomic layer deposition and SiN plasma-enhanced chemical vapor deposition;Carcia;J. Appl. Phys.,2009

3. Moisture permeation through ultrathin TiO2 films grown by atomic layer deposition;Seo;Appl. Phys. Express,2012

4. Fluorescent tags to visualize defects in Al2O3 thin films grown using atomic layer deposition;Zhang;Thin Solid Films,2009

5. Al2O3/ZrO2 nanolaminates as ultrahigh gas-diffusion barriers — a strategy for reliable encapsulation of organic electronics;Meyer;Adv. Mater.,2009

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3. Effect of nanoscopic defects on barrier performance of thin films deposited by plasma-enhanced atomic layer deposition on flexible polymers;Thin Solid Films;2021-11

4. Hydrogen Barriers Based on Chemical Trapping Using Chemically Modulated Al2O3 Grown by Atomic Layer Deposition for InGaZnO Thin-Film Transistors;ACS Applied Materials & Interfaces;2021-04-05

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