Author:
Hwang Yongtaek,Heo Kyuyoung,Chang Chang Hwan,Joo Man Kil,Ree Moonhor
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference17 articles.
1. High-κ gate dielectrics: Current status and materials properties considerations
2. Thermodynamic stability of binary oxides in contact with silicon
3. Band offsets of wide-band-gap oxides and implications for future electronic devices
4. Internl. Electron Devices Meeting, Washington, D.C., U.S.A., December 10–13, 2000;Buchanan,2000
5. Internl. Electron Devices Meeting, Washington, D.C., U.S.A., December 2–5, 2001;Gusev,2001
Cited by
30 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献