Morphological behavior and wear of polyurethane pads used in glass polishing process

Author:

Belkhir N.,Bouzid D.,Herold V.

Publisher

Elsevier BV

Subject

General Engineering

Reference25 articles.

1. Material removal mechanisms in lapping and polishing;Evans;Annals of the CIRP,2004

2. Hambücker S. Technologie der Politur sphärischer Optiken mit Hilfe der Synchrospeed-Kinematik Dissertation. RWTH Aachen; 2001.

3. The role of abrasion in the optical polishing of metals and glasses;Brown,1984

4. Fabrication methods for precision optics;Karow,2004

5. Etude éllipsométrique du mécanisme fondamentale de polissage du verre;Sakata;Journal of Applied Physics,1973

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4. Effect of Viscoelastic Characteristics on the Real Contact Area of Polishing Pad Surface;ECS Journal of Solid State Science and Technology;2024-04-01

5. Predicting Material Removal Rate in Chemical Mechanical Polishing (CMP) Using Explainable Machine Learning Methods;2024 Conference of Science and Technology for Integrated Circuits (CSTIC);2024-03-17

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