Silicon Dioxide, Nitride, and Oxynitride-Reference-Cited by-同舟云学术

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Silicon Dioxide, Nitride, and Oxynitride

Published:2003 Issue: Volume: Page:1-14
ISSN:
Container-title:Encyclopedia of Materials: Science and Technology
language:
Short-container-title:

Author:

Murarka S.P.

Publisher

Elsevier

Reference41 articles.

1. Ultrathin-gate dielectric processes for VLSI applications;Baglee,1983

2. Quick Reference Manual for Silicon Integrated Circuit Technology;Beadle,1985

3. Stress in silicon dioxide films deposited using chemical vapor deposition techniques and the effect of annealing on these stresses;Bhushan;J. Vac. Sci. Technol.,1990

4. Dielectric and polysilicon film deposition;Cheng,1996

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