1. Pressure sensors prepared with heavily boron polycrystalline silicon films by plasma assisted chemical vapour deposition;Yamazaki,1985
2. Heavily boron doped crystalline silicon films by plasma technique;Yoshida;Jpn. J. Appl. Phys.,1983
3. Preparation of polycrystalline Ge films by photo-assisted chemical vapour deposition;Kakuhara;Trans. Inst. Electr. Commun. Eng. Jpn.,1986
4. Piezoresistive elements using polycrystalline germanium films prepared by photo assisted chemical vapour deposition;Nagaune;Proc. 6th Sensor Symposium, Tsukuba, Japan,1986