The kinetics of silicon dioxide chemical vapour deposition I: Surface chemical reactions
Author:
Publisher
Elsevier BV
Subject
General Engineering
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Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Particle formation during low-pressure chemical vapor deposition from silane and oxygen: Measurement, modeling, and film properties;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2002-03
2. Theoretical Modeling of SiO2 Photochemical Vapor Deposition and Comparison to Experimental Results for Three Oxidant Chemistries: SiH4 + O2, H2O/O2, and H2O2;Chemistry of Materials;2001-07-10
3. ATOMIC LAYER DEPOSITION OF SiO2 USING CATALYZED AND UNCATALYZED SELF-LIMITING SURFACE REACTIONS;Surface Review and Letters;1999-06
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5. Micro/Macrocavity Method Applied to the Study of the Step Coverage Formation Mechanism of SiO2 Films by LPCVD;Journal of The Electrochemical Society;1990-04-01
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