Influence of air flow rate on structural and electrical properties of undoped indium oxide thin films-Reference-Cited by-同舟云学术

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Influence of air flow rate on structural and electrical properties of undoped indium oxide thin films

Published:1993-03 Issue:3-4 Volume:33 Page:204-207
ISSN:0254-0584
Container-title:Materials Chemistry and Physics
language:en
Short-container-title:Materials Chemistry and Physics

Author:

Mirzapour S.,Rozati S.M.,Takwale M.G.,Marathe B.R.,Bhide V.G.

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science

Reference15 articles.

1. Carrier compensation and activation energy studies in pyrolytic In2O3 thin film

2. Preparation and characterization of fluorinated indium tin oxide films prepared by r.f. sputtering

3. Band-gap widening in heavily Sn-dopedIn2O3

4. Indium tin oxide thin films prepared by chemical vapour deposition

5. Transparent Conducting Coatings

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Spray pyrolysis deposition of undoped SnO2 and In2O3 films and their structural properties;Progress in Crystal Growth and Characterization of Materials;2017-02

2. Growth of In2 O 3 Thin Films by Atomic Layer Epitaxy;Journal of The Electrochemical Society;1994-11-01

3. Influence of different process parameters on physical properties of fluorine dopes indium oxide thin films;Journal of Materials Science;1994-02

4. Influence of annealing on evaporated indium oxide thin films;Materials Chemistry and Physics;1994-01

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