Preparation and characterization of fluorinated indium tin oxide films prepared by r.f. sputtering-Reference-Cited by-同舟云学术

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Preparation and characterization of fluorinated indium tin oxide films prepared by r.f. sputtering

Published:1991-07 Issue:1 Volume:202 Page:77-82
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Geoffroy C.,Campet G.,Portier J.,Salardenne J.,Couturier G.,Bourrel M.,Chabagno J.M.,Ferry D.,Quet C.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. Transparent conductors—A status review

2. Fluorine-doped SnO2 films for solar cell application

3. Preparation and characterization of indium tin oxide films produced by the d.c. sputtering technique

4. The influence of deposition parameters on the optical and electrical properties of r.f.-sputter- deposited indium tin oxide films

5. C. Geoffroy, G. Campet, G. Couturier, J. Portier and J. Salardenne, submitted to Active Passive Electron. Compon.

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1. No Signature of Room Temperature Ferromagnetism in Fe-Doped ITO Thin Films;Journal of Superconductivity and Novel Magnetism;2018-06-08

2. Thickness of ITO thin film influences on fabricating ZnO nanorods applying for dye-sensitized solar cell;Composites Part B: Engineering;2015-06

3. Preparation of Fluorine-Containing Indium Tin Oxide Sputtering Targets using Spark Plasma Sintering Process;Journal of the American Ceramic Society;2008-08

4. Infrared Reflectance and Electrical Conductivity of ?-Ga2O3;physica status solidi (a);2002-09

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