Low temperature diffusion study of Xe implanted into a photoresist film
Author:
Publisher
Elsevier BV
Subject
General Physics and Astronomy
Reference10 articles.
1. Mass and energy dependence of implanted ion profiles in the AZ111 photoresist
2. Dose and energy dependence of implanted ion profiles (9:≦ 1 ≦ 83) in the AZ111 photoresist
3. A Monte Carlo computer program for the transport of energetic ions in amorphous targets
4. Anomalous depth profiles of light ions and noble gases implanted into polymers
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1. High-fluence implantation of iron into polyimide;Surface and Coatings Technology;2002-09
2. Anomalous depth distribution of Fe and Co atoms in polyimide implanted to high fluence;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2002-05
3. Anomalous depth profiles and diffusional behavior of noble gases implanted into photoresist films;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1996-08
4. Diffusion study of Kr, Rb and Xe implanted into positive and negative photoresist films;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1996-04
5. Cosmic ray simulator: A versatile apparatus for quantitative studies on the interaction of cosmic rays with frozen solids by on line and in situ quadrupole mass spectrometry and Fourier transform infrared spectroscopy;Review of Scientific Instruments;1995-04
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