Innovative Annealing Technology for Thermally Stable Ni(GeSn) Alloys
Author:
Affiliation:
1. Univ. Grenoble Alpes, CEA, LETI,Grenoble,France,F-38000
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10175156/10175093/10175097.pdf?arnumber=10175097
Reference8 articles.
1. Non-Equilibrium Growth of Surface Wrinkles Emerging in an SiO2/Si Stack during Si Melting Induced by UV Nanosecond Pulsed Laser Annealing
2. Pulsed laser annealing for advanced technology nodes: Modeling and calibration
3. Reaction of titanium-modulated nickel with germanium-tin under microwave and rapid thermal annealing
4. Impact of alloying elements (Co, Pt) on nickel stanogermanide formation
5. Recrystallization and interdiffusion processes in laser-annealed strain-relaxed metastable Ge0.89Sn0.11
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Advances in GeSn alloys for MIR applications;Photonics and Nanostructures - Fundamentals and Applications;2024-02
2. Use of Nanosecond Laser Annealing for Thermally Stable Ni(GeSn) Alloys;IEEE Journal of the Electron Devices Society;2023
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