Novel Scanning Nanosecond Laser Anneal with Variable Dwell and Real-time Process Control for Advanced Logic and Memory Applications-Reference-Cited by-同舟云学术

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Novel Scanning Nanosecond Laser Anneal with Variable Dwell and Real-time Process Control for Advanced Logic and Memory Applications

Published:2023-06-08 Issue: Volume: Page:
ISSN:
Container-title:2023 21st International Workshop on Junction Technology (IWJT)
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Author:

Kassim Joseph¹,Willemann Michael¹,Khaja Fareen¹,Thanigaivelan Thirumal¹

Affiliation:

1. Veeco, Inc. 335 East Trimble Road,San Jose,CA,USA,95035

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/10175156/10175093/10175099.pdf?arnumber=10175099

Reference14 articles.

1. Ultraviolet Nanosecond Laser Annealing for Low Temperature 3D-Sequential Integration Gate Stack

2. Nanosecond Laser Anneal for BEOL Performance Boost in Advanced FinFETs

3. Impact of Nanosecond Laser Annealing on the Formation of Titanium Silicides

4. PMOS contact resistance solution compatible to CMOS integration for 7 nm node and beyond

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