Emission Spectrographic Analysis of Tantalum Thin Films-Reference-Cited by-同舟云学术

Emission Spectrographic Analysis of Tantalum Thin Films

Published:1967-11 Issue:6 Volume:21 Page:364-367
ISSN:0003-7028
Container-title:Applied Spectroscopy
language:en
Short-container-title:Appl Spectrosc

Author:

Nohe J. D.¹

Affiliation:

1. Western Electric Company, Inc., Engineering Research Center, Princeton, New Jersey 08540

Abstract

A dc-arc technique is described for the analysis of impurities in tantalum thin films. Films are sputtered directly on ultrapure graphite substrates, heat oxidized, and removed mechanically. Graphite is employed as the buffer, and samples are compared to standards of similar composition. The graphite-substrate technique has been applied to films of other metals produced by sputtering, resistance-heating evaporation, and electron-beam evaporation. Only portions of the spectrographic procedure are modified for different metallic films.

Publisher

SAGE Publications

Subject

Spectroscopy,Instrumentation

Link

http://journals.sagepub.com/doi/pdf/10.1366/000370267774385605

Reference6 articles.

1. A NEW STRUCTURE IN TANTALUM THIN FILMS

2. Hodgman C. D., Ed. Handbook of Chemistry and Physics, (Chemical Rubber Publ. Co., Cleveland, Ohio, 1960–1961), 42nd ed., pp. 666–667.

3. Methods for Emission Spectrochemical Analysis (American Society for Testing Materials, Philadelphia, Pa., 1964), 4th ed., pp. 545–548.

4. The Spex Speaker, vol. VII, No. 4 (1962).

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