Development of Primary Reference Gas Mixture of CF4 and SF6 in N2 as CRM for Measurements of Their Emission from Semiconductor Process Tool-Reference-Cited by-同舟云学术

Development of Primary Reference Gas Mixture of CF4 and SF6 in N2 as CRM for Measurements of Their Emission from Semiconductor Process Tool

Published:2009 Issue:5 Volume:58 Page:407-416
ISSN:0525-1931
Container-title:BUNSEKI KAGAKU
language:en
Short-container-title:Bunseki kagaku

Author:

Matsumoto Nobuhiro¹,Noguchi Fumiko¹,Aoki Nobuyuki¹,Kato Kenji¹,Isaki Ryuichiro²,Sakata Susumu²,Yoshida Hidetoshi²,Ikeda Takuya²

Affiliation:

1. Organic Standards Section 1, Organic Analytical Chemistry Division, National Metrology Institute of Japan (NMIJ), National Institute of Advanced Industrial Science and Technology (AIST)

2. TAIYO NIPPON SANSO Corporation

Publisher

Japan Society for Analytical Chemistry

Subject

Analytical Chemistry

Link

http://www.jstage.jst.go.jp/article/bunsekikagaku/58/5/58_5_407/_pdf

Reference21 articles.

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2. 2) 環境省,経済産業省 : "温室効果ガス排出量算定.報告マニュアル ver 2.3", (2008.5).

3. 3) ガストロン,25, 22 (2007), ((株)ガスレビュー).

4. 4) N. Matsumoto, T. Watanabe, M. Maruyama, Y. Horimoto, T. Maeda, K. Kato : Metrologia, 41, 178 (2004).

5. 5) ISO 6142, Gas analysis - Preparation of calibration gas mixtures - Gravimetric methods, Geneva, International Organization for Standardization (2001).

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