Author:
Wang Ting ,Zhang Jian-Jun ,Huiyun Liu , ,
Abstract
In this article, the recent progress of III-V quantum dot lasers on silicon substrates for silicon photonic integration is reviewed. By introducing various epitaxial techniques, room-temperature 1.3-m InAs/GaAs quantum dot laser on Si, Ge and SiGe substrates have been achieved respectively. Quantum dot lasers on Ge substrate has an ultra-low threshold current density of 55.2 A/cm2 at room temperature, which can operate over 60 ℃ in continuous-wave mode. Futhermore, by using the SiGe virtual substrate, at 30 ℃ and an output power of 16.6 mW, a laser lifetime of 4600 h has been reached, which indicates a bright future for the large-scale photonic integration.
Publisher
Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
Subject
General Physics and Astronomy
Reference52 articles.
1. Zhou Z P 2012 Si-based Optoeletronics (Beijing: Beijing University Press) (in Chinese) [周治平 2012 硅基光电子学 (北京: 北京大学出版社)]
2. Camacho-Aguilera R E, Cai Y, Patel N, Bessette J T, Romagnoli M, Kimerling L C, Michel J 2012 Opt. Express 20 11316
3. Wirths S, Geiger R, von den Driesch N, Mussler G, Stoica T, Mantl S, Ikonic Z, Luysberg M, Chiussi S, Hartmann J M, Sigg H, Faist J, Buca D, Grtzmacher D 2015 Nat. Photon. 9 88
4. D'Avezac M, Luo J W, Chanier T, Zunger A 2012 Phys. Rev. Lett. 108 027401
5. Liu H, Wang T, Jiang Q, Hogg R, Tutu F, Pozzi F, Seeds A 2011 Nat. Photon. 5 416
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