Theoretical study of linewidth enhancement factor of InGaAs/GaAs strained quantum well lasers

Author:

Zhang Fan ,Li Lin ,Ma Xiao-Hui ,Li Zhan-Guo ,Sui Qing-Xue ,Gao Xin ,Qu Yi ,Bo Bao-Xue ,Liu Guo-Jun , ,

Abstract

A simple model of calculating the linewidth enhancement factor ( factor) is presented by introducing the correlative theory and its conversion formula of the factor in detail. The contributions of interband transition, free carrier absorption and band gap narrowing to the factor are taken into account. Carrier concentration and differential gain dependence of photon energy are obtained from the gain curves for different carrier concentrations. The gain curves and the factor of InGaAs/GaAs quantum well are simulated, separately, and the results accord well with those reported in the literature. Subsequently discussed are two important parameters of InGaAs/GaAs quantum well laser containing quantum well width and In mole fraction. The results show that the increase of two parameters leads the factor to increase.

Publisher

Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences

Subject

General Physics and Astronomy

Reference26 articles.

1. Govind P A, Charles M B 1993 Photon. Technol. Lett. 5 640

2. Henry C H 1982 Quantum Electron 18 259

3. Yu Y G, Yan Y X 2006 Laser & Infrared 36 114 (in Chinese) [禹延光, 闫艳霞 2006 激光与红外 36 114]

4. Song Z X, Yu Y G, Ye H Y, Zhang X 2008 Study on Optical Communications2 60 (in Chinese) [宋兆欣, 禹延光, 叶会英, 张旭 2008 光通信研究 2 60]

5. Seo W H, Donegan J F 2003 Appl. Phys. Lett. 82 505

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