Author:
CAI WEI-QUAN ,LI CHUAN-WEN ,HUO YUN-SHENG ,WANG YU-ZHU ,
Abstract
A new nanometer lithographic techniqueatom lithography,which is developed based on the principles of laser cooling and trapping of neutral atomsthe newest achievements of quantum optics,has been reviewed.The working principles,the overall schemes,the individual techniques and the acquired results are described.This new method has been compared with the existing micro-lithographic techniques,and the application potentialities in the micro-electronics and other fields have been discussed.
Publisher
Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
Subject
General Physics and Astronomy
Cited by
14 articles.
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