Picosecond carrier dynamics in InAs and GaAs revealed by ultrafast electron microscopy

Author:

Perez Christopher12ORCID,Ellis Scott R.13ORCID,Alcorn Francis M.1ORCID,Smoll Eric J.1ORCID,Fuller Elliot J.1ORCID,Leonard Francois1ORCID,Chandler David1,Talin A. Alec1ORCID,Bisht Ravindra Singh4,Ramanathan Shriram4,Goodson Kenneth E.2ORCID,Kumar Suhas1ORCID

Affiliation:

1. Sandia National Laboratories, Livermore, CA, USA.

2. Department of Mechanical Engineering, Stanford University, Stanford, CA, USA.

3. Intel Corporation, San Jose, CA, USA.

4. Department of Electrical and Computer Engineering, Rutgers, The State University of New Jersey, Piscataway, NJ, USA.

Abstract

Understanding the limits of spatiotemporal carrier dynamics, especially in III-V semiconductors, is key to designing ultrafast and ultrasmall optoelectronic components. However, identifying such limits and the properties controlling them has been elusive. Here, using scanning ultrafast electron microscopy, in bulk n-GaAs and p-InAs, we simultaneously measure picosecond carrier dynamics along with three related quantities: subsurface band bending, above-surface vacuum potentials, and surface trap densities. We make two unexpected observations. First, we uncover a negative-time contrast in secondary electrons resulting from an interplay among these quantities. Second, despite dopant concentrations and surface state densities differing by many orders of magnitude between the two materials, their carrier dynamics, measured by photoexcited band bending and filling of surface states, occur at a seemingly common timescale of about 100 ps. This observation may indicate fundamental kinetic limits tied to a multitude of material and surface properties of optoelectronic III-V semiconductors and highlights the need for techniques that simultaneously measure electro-optical kinetic properties.

Publisher

American Association for the Advancement of Science (AAAS)

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