Nondestructive imaging of atomically thin nanostructures buried in silicon-Reference-Cited by-同舟云学术

Nondestructive imaging of atomically thin nanostructures buried in silicon

Published:2017-06-02 Issue:6 Volume:3 Page:
ISSN:2375-2548
Container-title:Science Advances
language:en
Short-container-title:Sci. Adv.

Author:

Gramse Georg¹,Kölker Alexander²³,Lim Tingbin²,Stock Taylor J. Z.²^ORCID,Solanki Hari²,Schofield Steven R.²⁴^ORCID,Brinciotti Enrico⁵^ORCID,Aeppli Gabriel⁶⁷⁸⁹,Kienberger Ferry⁵,Curson Neil J.²³^ORCID

Affiliation:

1. Johannes Kepler University, Biophysics Institute, Gruberstrasse 40, 4020 Linz, Austria.

2. London Centre of Nanotechnology, University College London (UCL), 17-19 Gordon Street, London WC1H 0AH, UK.

3. Department of Electronic and Electrical Engineering, UCL, Torrington Place, London WC1E 7JE, UK.

4. Department of Physics and Astronomy, UCL, Gower Street, London WC1E 6BT, UK.

5. Keysight Laboratories, Keysight Technologies Inc., Gruberstrasse 40, 4020 Linz, Austria.

6. Department of Physics, ETH, Zurich CH-8093, Switzerland.

7. Institut de Physique, École polytechnique fédérale de Lausanne, Lausanne CH-1015, Switzerland.

8. Paul Scherrer Institut, Villigen CH-5232, Switzerland.

9. Bio Nano Consulting, Gridiron Building, One Pancras Square, London N1C 4AG, UK.

Abstract

Microwave microscopy enables three-dimensional characterization of atomically thin semiconductor structures with nanometer precision.

Funder

EU FP7

FWF

FFG

Engineering and Physical Sciences Research Council

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

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5. Toward atomic-scale device fabrication in silicon using scanning probe microscopy;Ruess F. J.;Nano Lett.,2004

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